In this paper, a comparative study is done on performance of strained SiGe Heterojunction Bipolar Transistors (HBTs) with 100nm base width of conventional transistor. The device parameters like energy band gap variation, electron current density, electron drift velocity, electron and hole mobility are discussed. Here the current gain of strained SiGe layers was observed to increase by seven times as compared to bulk Si, because of the improvement in mobility in the trapezoid-base Si0.88Ge0.12 HBT. The strained SiGe HBT had 0.07 v lower turn on voltage than BJTs. The DC current gain of SiGe HBT can be improved further, by increasing Ge mole fraction. The simulation and parameter extraction have been done through the device simulator atlas module of SILVACO software.
목차
Abstract 1. Introduction 2. Physical Modelling 3. Material Parameters 4. Device Structures and Simulation 5. Device Structures and Simulation 6. Conclusion References
키워드
strained silicon-germanium HBTsdifferent Ge profileanalog performancevoltage gain
저자
P. Behera [ Department of Electronics & Telecom Engineering, Ajay Binay Institute of Technology (ABIT), Cuttack, 753014, Odisha, India. ]
S. K. Mohapatra [ Department of Electronics & Telecom Engineering, Ajay Binay Institute of Technology (ABIT), Cuttack, 753014, Odisha, India. ]
보안공학연구지원센터(IJAST) [Science & Engineering Research Support Center, Republic of Korea(IJAST)]
설립연도
2006
분야
공학>컴퓨터학
소개
1. 보안공학에 대한 각종 조사 및 연구
2. 보안공학에 대한 응용기술 연구 및 발표
3. 보안공학에 관한 각종 학술 발표회 및 전시회 개최
4. 보안공학 기술의 상호 협조 및 정보교환
5. 보안공학에 관한 표준화 사업 및 규격의 제정
6. 보안공학에 관한 산학연 협동의 증진
7. 국제적 학술 교류 및 기술 협력
8. 보안공학에 관한 논문지 발간
9. 기타 본 회 목적 달성에 필요한 사업
간행물
간행물명
International Journal of Advanced Science and Technology
간기
월간
pISSN
2005-4238
수록기간
2008~2016
십진분류
KDC 505DDC 605
이 권호 내 다른 논문 / International Journal of Advanced Science and Technology Vol.71