Earticle

초록

영어

The screen printing has to correspond with the higher efficiency and micronization of IC or LSI. Now higher precision and density in screen printing are strictly required and the precision has to be even less than 100 micron meter which brought up the shift to photographic process in this field. But in view of mass production screen printing has such advantage that it will promise to take an important part among electronics
materials in future.
UV-curable resin has the properties of quick-drying, high productivity at low temperature, energy saving, space saving, solventless, non-polluting and low-stinking, and thus, UV-curing system has been widely used in the fields of printing inks, adhesives, paints and coating agents.
This study has been executed to phosphor micro-patterning used UV-curable resin.
The phosphor micro-patterning properties of this photoresist were investigated under irradiation of UV light low pressure mercury lamp. When the exposed photoresist film was developed by pure water developer, the resolution of this photoresist was about 50㎛.

목차

Abstract
 1. 서론
 2. 실험
  2-1. 시료
  2-2. 실험 방법
  2-3. 측정
 3. 결과 및 고찰
 4. 결론
 참고문헌

저자

• 조상훈 [ Sang-Hoon Cho | 부경대학교 대학원 인쇄공학과 ]
• 남수용 [ Su-Yong Nam | 부경대학교 공과대학 화상정보공학부 ]
• 최상국 [ Sang-Kuk Choi | 부경대학교 대학원 인쇄공학과 ]

참고문헌

발행기관

간행물

표지보기 관심저널 등록

• 간행물명

  한국인쇄학회지 [JOURNAL OF THE KOREAN GRAPHIC ARTS COMMUNICATION SOCIETY]

• 간기

  연간

• pISSN

  1226-1149

• 수록기간

  1983~2025

• 십진분류

  KDC 586 DDC 686