Earticle

초록

영어

Synthesis of poly[N-(formyloxyphenyl)maleimide](PFOMI) as photopolymer were investigated with various kinds of photosensitive groups. Generally, photopolyimide have some deficiencies in solubility, sensitivity, reserve stability of the photosensitive solution, and the precision of image pattern. The study has been required on those polymers which have high glass transition temperature and photo efficiency, and low dielectricity. The existing condensation resins require high curing temperature and perfect elimination of subreacted materials that are produced during the process after irradiation and various membrane damages such as the deformation and contraction in image pattern cure. In this study poly[N-(hydroxyphenyl)maleimide](PHPMI) was synthesized. The PHPMI were analyzed by H-NMR and FT-IR. The measured number average molecular weight of PHPMI was produced was 1.06 ×104. Poly[N-(formyloxyphenyl)maleimide](PFOMI) as a type of photo-Fries rearrangement was synthesized by NHPMI and formic acid followed by radical polymerization. PFOMI was analyzed by FT-IR, and photocharacteristics was investgated by UV spectra and FT-IR before and after UV irradiation. Based on the image characteristics of PFOMI measured from optical micrographs, it was formed that the resolution of positive type PFOMI was 0.5 um.

목차

Abstract
 서론
 실험
  N-(hydroxyphenyl) maleimide(NHPMI)의 합성
  Photo-Fries 전위형 polyimide(PFOMI)의 합성
 결과 및 고찰
  NHPMI의 특성
  PFOMI polymaleimide의 특성 
  PFOMI의 감광특성
 결론
 참고문헌

저자

• 김상민 [ Sang Min Kim | 신성대학 화장품 신소재계열 ]

참고문헌

발행기관

간행물

표지보기 관심저널 등록

• 간행물명

  한국포장학회지 [Journal of Korea Society of Packaging Science & Technology]

• 간기

  연3회

• pISSN

  1226-0207

• 수록기간

  1994~2026

• 등재여부

  KCI 등재

• 십진분류

  KDC 530 DDC 620