A theoretical model for the I-V characteristics of buried-gate GaAs metal semiconductor field-effect transistors has been developed by solving dc continuity equation. This analysis includes the ion implanted buried-gate process. It is shown that the current- voltage could be rather increased when introducing an optical fiber to the buried-gate GaAs MESFETs structure. The current -voltage characteristics and the channel conductance of the device have been evaluated. The results indicate very good performance of the device compared to other devices like MESFET under back illumination and MESFET with front illumination having surface gate. Buried-gate optical field effect transistor (OPFET) will be highly suitable for power device application, optical communication and optical computing.
목차
Abstract 1. Introduction 2. Theory 3. Channel current and drain current 3.1 Current due to depletion region 3.2 Current due to Neutral Region 3.3 Current Due to Ion-Implantation 3.4 Calculation of Photo voltage 3.5 Channel Conductance 4. Results and Discussion 4 Conclusion References
키워드
Metal Field Effect Transistor (MESFET)Enhancement-mode (EMESFET)Depletion-mode MESFET (D-MESFET)optical field effect transistor (OPFET).
저자
Jaya.T [ Electronics and Communication Engg; Sathyabama University ]
Kannan.V [ Electronics and Communication Engg; Sathyabama University ]
보안공학연구지원센터(IJAST) [Science & Engineering Research Support Center, Republic of Korea(IJAST)]
설립연도
2006
분야
공학>컴퓨터학
소개
1. 보안공학에 대한 각종 조사 및 연구
2. 보안공학에 대한 응용기술 연구 및 발표
3. 보안공학에 관한 각종 학술 발표회 및 전시회 개최
4. 보안공학 기술의 상호 협조 및 정보교환
5. 보안공학에 관한 표준화 사업 및 규격의 제정
6. 보안공학에 관한 산학연 협동의 증진
7. 국제적 학술 교류 및 기술 협력
8. 보안공학에 관한 논문지 발간
9. 기타 본 회 목적 달성에 필요한 사업
간행물
간행물명
International Journal of Advanced Science and Technology
간기
월간
pISSN
2005-4238
수록기간
2008~2016
십진분류
KDC 505DDC 605
이 권호 내 다른 논문 / International Journal of Advanced Science and Technology vol.17