Earticle

초록

영어

Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Here, we attempt to give an overview of the trend of the Nanoimprint lithography (NIL) technology in Korea and China. First NIL fundamentals including thermal NIL and UV-NIL are introduced. And technical issues around stamp fabrication are discussed. To illustrate the potentials of the techniques, some applications of NIL are described. Next, nanotechnology and NIL technology of Korea and China are discussed in the view of the investment budget, technology strategy, driving system and academic conferences.

목차

ABSTRACT
 I. Introduction
 2. Nanoimprint Lithography Technology, the Next Generation of Lithography
  2.1 Nanoimprint Lithography(NIL) Fundamentals
  2.2 Technical Issues in NIL
  2.3 NIL Applications
 3. Nanotechnology and Nanoimprint Lithography in Korea and China
  3.1 Nanotechnology and Nanoimprint Lithography in Korea
  3.2 Nanotechnology and Nanoimprint Lithography in China
  3.3 Conferences & Exhibitions
 4. Conclusions
 References

저자

• Kug Weon Kim [ Department of Mechanical Engineering, Soonchunhyang University ]

참고문헌